Improvement mechanism of sputtered AlN films by high-temperature annealing

TitleImprovement mechanism of sputtered AlN films by high-temperature annealing
Publication TypeJournal Article
Year of Publication2018
AuthorsXiao S, Suzuki R, Miyake H, Harada S, Ujihara T
JournalJournal of Crystal Growth
Volume502
Pagination41 - 44
Date PublishedJan-11-2018
ISSN00220248
DOI10.1016/j.jcrysgro.2018.09.002
Short TitleJournal of Crystal Growth