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Preparation of high-quality thick AlN layer on nanopatterned sapphire substrates with sputter-deposited annealed AlN film by hydride vapor-phase epitaxy
| Title | Preparation of high-quality thick AlN layer on nanopatterned sapphire substrates with sputter-deposited annealed AlN film by hydride vapor-phase epitaxy |
| Publication Type | Journal Article |
| Year of Publication | 2019 |
| Authors | Xiao S, Jiang N, Shojiki K, Uesugi K, Miyake H |
| Journal | Japanese Journal of Applied Physics |
| Volume | 58 |
| Issue | SC |
| Pagination | SC1003 |
| Date Published | Jan-06-2019 |
| ISSN | 0021-4922 |
| DOI | 10.7567/1347-4065/ab0ad4 |
| Short Title | Jpn. J. Appl. Phys. |
